The Analogue Design Research of Precursor Gas Flow Field in the Deposition Chamber for Aluminide Coating Device Deposited by the CVD Method

doi:10.16577/j.cnki.42-1215/tb.2021.05.001

ZHANG Bo - wen, WU Yong, YANG Fu, HUANG Tian - zong, MENG Shi - xu, ZHAO Zhi - xin

Materials Protection ›› 2021, Vol. 54 ›› Issue (5) : 1-6.

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Materials Protection ›› 2021, Vol. 54 ›› Issue (5) : 1-6. DOI: 10.16577/j.cnki.42-1215/tb.2021.05.001

The Analogue Design Research of Precursor Gas Flow Field in the Deposition Chamber for Aluminide Coating Device Deposited by the CVD Method

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2021, 54(5): 1-6 https://doi.org/10.16577/j.cnki.42-1215/tb.2021.05.001

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