磁控溅射技术制备氮化钛薄膜的研究进展
收稿日期: 2022-08-20
修回日期: 2022-09-15
录用日期: 2022-10-17
网络出版日期: 2023-08-11
基金资助
国家科技重大专项(2017-Ⅶ-0012-0109)资助
Research Progress of Titanium Nitride Thin Films Prepared by Magnetron Sputtering Technology
Received date: 2022-08-20
Revised date: 2022-09-15
Accepted date: 2022-10-17
Online published: 2023-08-11
李昌恒, 刘奎仁, 魏世丞, 韩庆, 王博, 王玉江 . 磁控溅射技术制备氮化钛薄膜的研究进展[J]. 材料保护, 2023 , 56(2) : 111 -119 . DOI: 10.16577/j.issn.1001-1560.2023.0041
[1] SUN Z P,HE G Y,MENG Q J,et al.Corrosion mechanism investigation of TiN/Ti coating and TC4 alloy for aircraft compressor application[J].Chinese Journal of Aeronautics,2020,171(6): 256-267.
[2] CAO X,HE W,HE G,et al.Sand erosion resistance improvement and damage mechanism of TiAlN coating via the bias-graded voltage in FCVA deposition[J].Surface and Coatings Technology,2019,378: 125 009.
[3] ZHANG M,CHENG Y,XIN L,et al.Cyclic oxidation behaviour of Ti/TiAlN composite multilayer coatings deposited on titanium alloy [J].Corrosion Science,2020,166:108 476.
[4] 况 婷.磁控溅射法制备TiN 颜色薄膜的研究[D].武汉: 武汉理工大学,2014.KUANG T.Study on preparation of TiN color films by magnetron sputtering[D].Wuhan: Wuhan University of Technology,2014.
[5] 张 朋,苏晓磊,唐显琴,等.磁控溅射法制备TiN 薄膜及其性能研究[J].材料保护,2020,53(9): 76-81.ZHANG P,SU X L,TANG X Q,et al.Preparation of TiN Films by Magnetron Sputtering Method and Evaluation of Their Properties[J].Materials Protection,2020,53(9):76-81.
[6] 李学瑞,曹 振,于公奇,等.氮氩流量比与基底温度对射频溅射TiN 薄膜性能的影响[J].电镀与涂饰,2021,40(23): 1 776-1 780.LI X R,CAO Z,YU G Q,et al.Effects of N2/Ar flow ratio and substrate temperature on properties of RF-sputtered TiN film[J].Electroplating & Finishing,2021,40 (23):1 776-1 780.
[7] KOSTRIN D K.Single-layer and multi-layer wear-resistant coatings[J].Vakuum in Forschung und Praxis,2019,31(2): 32-35.
[8] JIN J,HE Z,ZHAO X.Effect of Al content on the corrosion resistance and conductivity of metal nitride coating in the cathode environment of PEMFCs[J].Materials Chemistry and Physics,2020,245: 122 739.
[9] ZHANG M,NIU Y,XIN L,et al.Studies on corrosion resistance of thick Ti/TiN multilayer coatings under solid NaCl-H2O-O2at 450 ℃[J].Ceramics International,2020,46(11): 19 274-19 284.
[10] ELMKHAH H,ATTARZADEH F,FATTAH-ALHOSSEINI A,et al.Microstructural and electrochemical comparison between TiN coatings deposited through HIPIMS and DCMS techniques[J].Journal of Alloys and Compounds,2017,735: 422-429.
[11] KAINZ C,SCHALK N,TKADLETZ M,et al.The effect of B and C addition on microstructure and mechanical properties of TiN hard coatings grown by chemical vapor deposition[J].Thin Solid Films,2019,688: 137 283.
[12] ARIF M,SAUER M,FOELSKE-SCHMITZ A,et al.Characterization of aluminum and titanium nitride films prepared by reactive sputtering under different poisoning conditions of target[J].Journal of Vacuum Science and Technology A Vacuum Surfaces and Films,2017,35(6): 061 507.
[13] KAINZ C,SCHALK N,TKADLETZ M,et al.Microstructure and mechanical properties of CVD TiN/TiBN multilayer coatings[J].Surface and Coatings Technology,2019,370:311-319.
[14] SHUAI J,ZUO X,WANG Z,et al.Erosion behavior and failure mechanism of Ti/TiAlN multilayer coatings eroded by silica sand and glass beads[J].Journal of Materials Science and Technology,2021,80: 179-190.
[15] SOUSA V F C,DA S,PINTO G F,et al.Characteristics and Wear Mechanisms of TiAlN-Based Coatings for Machining Applications: A Comprehensive Review[J].Metals,2021,11(2): 260.
[16] 王 博,魏世丞,王玉江,等.磁控溅射技术制备二氧化钛薄膜研究进展[J].表面技术,2018,47(8):257-264.WANG B,WEI S C,WANG Y J,et al.Titanium-oxide Thin Films Prepared by Magnetron Sputtering Method[J].Surface Technology,2018,47(8): 257-264.
[17] 徐万劲.磁控溅射技术进展及应用(上)[J].现代仪器,2005(5): 1-5.XU W J.Progress andapplication of magnetron sputtering technology (Part 1)[J].Modern Instrument,2005(5):1-5.
[18] 徐万劲.磁控溅射技术进展及应用(下)[J].现代仪器,2005(6): 9-14.XU W J.Progress and application of magnetron sputtering technology (Part 2)[J].Modern Instrument,2005(6):9-14.
[19] 李 芬,朱 颖,李刘合,等.磁控溅射技术及其发展[J].真空电子技术,2011(3): 49-54.LI F,ZHU Y,LI L H,et al.Review on Magnetron Sputtering Technology and Its Development[J].Vacuum Electronics Technology,2011(3): 49-54.
[20] 杜宁乐.反应磁控溅射制备TiN 及TiAlN 薄膜与性能研究[D].青岛: 山东科技大学,2018.DU N L.Preparation and properties of TiN and TiAlN thin films by reactive magnetron sputtering[D].Qingdao: Shandong University of Science and Technology,2018.
[21] XIAO W W,DENG H,ZOU S L,et al.Effect of roughness of substrate and sputtering power on the properties of TiN coatings deposited by magnetron sputtering[J].Journal of Nuclear Materials,2018,509: 542-549.
[22] 王世红.磁控溅射制备氮化钛及其复合薄膜材料的耐腐蚀性研究[D].青岛: 中国石油大学,2008.WANG S H.Study on corrosion resistance of titanium nitride and its composite thin films prepared by magnetron sputtering[D].Qingdao: China Universityof Petroleum,2008.
[23] 刘冠威.TiN 氢催化膜磁控溅射制备与氢传输性能[D].哈尔滨: 哈尔滨工业大学,2019.LIU G W.Preparation and hydrogen transport properties of TiN hydrogen catalyzed films by magnetron sputtering[D].Harbin: Harbin Institute of Technology,2019.
[24] ZHANG H,LUO C G,DUO S W,et al.Effect of deposition time on hardness and bonding strength of magnetron sputtered TiN coatings on 316 stainless steel[J].Key Engineering Materials,2017,726: 303-307.
[25] 罗学萍,赖 奇.不锈钢表面溅射沉积氮化钛薄膜的结构与性能分析[J].钢铁钒钛,2019,40(6): 52-56.LUO X P,LAI Q.Structure and Properties of TiN Thin Film Deposited on Stainless Steel Surface by Sputtering[J].Steel Vanadium Titanium,2019,40(6): 52-56.
[26] 顾宝宝.磁控溅射制备玻璃基TiN 增硬薄膜及其性能研究[D].武汉: 武汉理工大学,2017.GU B B.Preparation and properties of glass - based TiN hardening films by magnetron sputtering[D].Wuhan: Wuhan University of Technology,2017.
[27] ÇAHA I,ALVES A C,AFFONÇO L J,et al.Corrosion and tribocorrosion behaviour of titanium nitride thin films grown on titanium under different deposition times[J].Surface and Coatings Technology,2019,374: 878-888.
[28] FOSSATI A,BORGIOLI F,GALVANETTO E,et al.Corrosion resistance properties of plasma nitrided Ti-6Al-4V alloy in nitric acid solutions[J].Corrosion Science,2004,46(4): 917-927.
[29] SCERRI A,BUHAGIAR J,BANFIELD S,et al.Corrosion behaviour of triode plasma diffusion treated and PVD TiNcoated Ti-6Al-4V in acidified aqueous chloride environments[J].Surface and Coatings Technology,2015,280:185-193.
[30] 张金林.磁控溅射金属增韧的TiN/AlN 纳米多层膜制备与性能研究[D].沈阳: 沈阳大学,2012.ZHANG J L.Preparation and properties of magnetron sputtering metal-toughened TiN/AlN nano multilayers[D].Shenyang: Shenyang University,2012.
[31] OLBRICH W,KAMPSCHULTE G.Superimposed pulse bias voltage used in arc and sputter technology[J].Surface and Coatings Technology,1993,59(1-3): 274-280.
[32] DEBAJYOTI B,ARNAB G,SOUMYA G,et al.Effect of target frequency,bias voltage and bias frequency on microstructure and mechanical properties of pulsed DC CFUBM sputtered TiN coating[J].Surface and Coatings Technology,2010,204(21): 3 684-3 697.
[33] 徐成俊.磁控溅射TiN 及ZrN 薄膜的特性研究[D].重庆: 重庆大学,2005.XU C J.Properties of TiN and ZrN films by magnetron sputtering[D].Chongqing: Chongqing University,2005.
[34] 刘 倩.磁控溅射法制备氮化钛薄膜及其结构与电性能研究[D].南昌: 南昌大学,2009.LIU Q.Microstructure and electrical properties of titanium nitride films prepared by magnetron sputtering[D].Nanchang: Nanchang University,2009.
[35] 曹殿鹏,邹树梁,肖魏魏,等.预处理和溅射工艺参数对锆合金表面TiN 涂层膜/基结合强度的影响[J].原子能科学技术,2018,52(11): 2 095-2 100.CAO D P,ZOU S L,XIAO W W,et al.Influence of Pretreatment and Sputtering Parameter on Film/Base Bond Strength of TiN Coating on Zirconium Alloy Surface[J].Atomic Energy Science and Technology,2018,52(11):2 095-2 100.
[36] 肖畅飞,邹树梁,唐德文,等.沉积温度对直流磁控溅射TiN 薄膜结构和表面形貌的影响[J].南华大学学报(自然科学版),2017,31(4): 86-89.XIAO C F,ZOU S L,TANG D W,et al.Effect of Deposition Temperature on Structure and Surface Morphology of TiN Thin Films Prepared by DC Magnetron Sputtering[J].Journal of University of South China (Natural Science),2017,31(4): 86-89.
[37] 马群超.TiN 及其掺杂/复合薄膜的制备与研究[D].郑州: 郑州大学,2019.MA Q C.Preparation and study of TiN and its doped/composite thin films[D].Zhengzhou: Zhengzhou University,2019.
[38] STOEHR M,SHIN C S,PETROV I,et al.Raman scattering from TiNx(0.67≤x≤1.00) single crystals grown on MgO(001)[J].Journal of Applied Physics,2011,110(8): 083 503.
[39] JITHIN M A,LAKSHMI G K,VIKRAM G,et al.Pulsed DC magnetron sputtered titanium nitride thin films for localized heating applications in MEMS devices[J].Sensors and Actuators: A.Physical,2018,272: 199-205.
[40] MENG L J,SANTOS M.Characterization of titanium nitride films prepared by d.c.reactive magnetron sputtering at different nitrogen pressures[J].Surface and Coatings Technology,1997,90(1/2): 64-70.
[41] ARSHI N,LU J,YUN K J,et al.Study on structural,morphological and electrical properties of sputtered titanium nitride films under different argon gas flow[J].Materials Chemistry and Physics,2012,134(2/3): 839-844.
[42] LAL K,MEIKAP A K,CHATTOPADHYAY S K,et al.Electrical resistivity of titanium nitride thin films prepared by ion beam-assisted deposition[J].Physica B Physics of Condensed Matter,2001,307(1-4): 150-157.
[43] LIANG H L,JIN X,ZHOU D Y,et al.Thickness dependent microstructural and electrical properties of TiN thin films prepared by DC reactive magnetron sputtering[J].Ceramics International,2016,42(2): 2 642-2 647.
[44] 王 男.磁控溅射制备超薄TiN 薄膜电极[D].大连: 大连理工大学,2014.WANG N.Ultrathin TiN film electrode was prepared by magnetron sputtering [D].Dalian: Dalian University of Technology,2014.
[45] 王 静.反应磁控溅射金属/TiN 多层膜及金属掺杂TiN薄膜的制备与特性[D].延边: 延边大学,2012.WANG J.Preparation and properties of metal/TiN multilayers and metal doped TiN films by reactive magnetron sputtering[D].Yanbian: Yanbian University,2012.
[46] WITTMER M.Properties and microelectronics applications of thin films refractory metal nitrides[J].Journal of Vacuum Science and Technology A,1985,3(4): 1 797-1 803.
[47] THORNTON,JOHN A.The microstructure of sputter-deposited coatings[J].Journal of Vacuum Science and Technology A,1986,4(6): 3 059-3 065.
[48] LI H Y,LIU Y Z,GAO B X,et al.Highly (200) -preferred orientation TiN thin films grown by DC reactive magnetron sputtering[J].American Journal of Physics and Applications,2017,5(3): 41-45.
[49] LU G Y,YU L H,JU H B,et al.Influence of nitrogen content on the thermal diffusivity of TiN films prepared by magnetron sputtering[J].Surface Engineering,2019,36(1):1-7.
[50] KIMURA T,YOSHIDA R,MISHIMA T,et al.Preparation of TiN films by reactive high-power pulsed sputtering Penning discharges[J].Japanese Journal of Applied Physics,2018,57(6S2): 06JE02.1-06JE02.6.
[51] ZHOU T,LIU D W,ZHANG Y,et al.Microstructure and hydrogen impermeability of titanium nitride thin films deposited by direct current reactive magnetron sputtering[J].Journal of Alloys and Compounds,2016,688(Pt.A):44-50.
[52] WEI B B,LIANG H F,ZHANG D F,et al.Magnetron sputtered TiN thin films toward enhanced performance supercapacitor electrodes[J].Materials for Renewable and Sustainable Energy,2018,7(2): 1-9.
[53] WUHRER R,KIM S,YEUNG W Y.Effect of nitrogen partial pressure on the surface morphology and properties of reactive dc magnetron sputtered (Ti,Al) N coatings[J].Scripta Materialia,1997,37(8): 1 163-1 169.
[54] ZAITSEV S V,VASHCHILIN V S,PROKHORENKOV D S,et al.Influence of annealing temperature on the microstructure and morphology of TiN films synthesized by dual magnetron sputtering [J].Technical Physics,2018,63(8): 1 189-1 193.
[55] KAVITHA A,KANNAN R,REDDY P S,et al.The effect of annealing on the structural,optical and electrical properties of Titanium Nitride (TiN) thin films prepared by DC magnetron sputtering with supported discharge[J].Journal of Materials Science: Materials in Electronics,2016,27(10): 10 427-10 434.
[56] PONON N K,APPLEBY D,ARAC E,et al.Effect of deposition conditions and post deposition anneal on reactively sputtered titanium nitride thin films[J].Thin Solid Films,2015,578(Mar.2): 31-37.
[57] GU P,ZHU X H,LI J T,et al.Influence of substrate and Ar/N2gas flow ratio on structural,optical and electrical properties of TiN thin films synthetized by DC magnetron sputtering[J].Journal of Materials Science: Materials in Electronics,2018,29(12): 9 893-9 900.
[58] 朱秀榕.氮化钛薄膜的制备及其光、电性能的研究[D].南昌: 南昌大学,2008.ZHU X R.Preparation of titanium nitride thin films and their photoelectrical properties[D].Nanchang:Nanchang University,2008.
/
〈 |
|
〉 |