不同负偏压下多弧离子镀TiAlN薄膜的微观结构与耐腐蚀性研究

赵磊, 梁启超, 刘传龙, 王天国

doi:10.16577/j.issn.1001-1560.2022.0285

材料保护 >

2022 , Vol. 55 >Issue 10: 118 - 122

DOI: https://doi.org/10.16577/j.issn.1001-1560.2022.0285

工艺探讨

不同负偏压下多弧离子镀TiAlN薄膜的微观结构与耐腐蚀性研究

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(1.十堰市工业产品质量检验检测所，湖北十堰 442002；2.湖北汽车工业学院材料科学与工程学院，湖北十堰 442002)

梁启超(1992-)，硕士，研究方向为多弧离子镀硬质薄膜技术，电话：0719-8362272，E-mail:502119735@qq.com

收稿日期: 2022-04-21

修回日期: 2022-05-23

录用日期: 2022-07-06

网络出版日期: 2023-12-23

基金资助

湖北省教育厅科学技术项目(Q20181802) 资助

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Study on Microstructure and Corrosion Resistance of TiAlN Films Deposited by Multi - Arc Ion Plating under Different Negative Bias Voltages

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(1.Shiyan Industrial Product Quality Inspection and Testing Institute,Shiyan 442002,China;2.School of Materials Science and Engineering,Hubei University of Automotive Technology,Shiyan 442002,China)

Received date: 2022-04-21

Revised date: 2022-05-23

Accepted date: 2022-07-06

Online published: 2023-12-23

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摘要

目前，关于负偏压对电弧离子镀TiAlN薄膜耐腐蚀性能影响的研究较少，为此，采用电弧离子镀技术在M2高速钢上沉积TiAlN薄膜，分别采用扫描电镜(SEM)、X射线衍射仪(XRD)、电化学实验等方法研究基体负偏压量对薄膜表面形貌、组织结构和耐腐蚀性的影响。结果表明：负偏压是影响电弧离子镀TiAlN薄膜表面形貌的一个重要工艺参数。适当的负偏压能有效改善表面薄膜形貌及致密性，降低表面大颗粒熔滴尺寸及数量。TiAlN薄膜主要相为AlTi3N(111)、薄膜主要沿着(111)方向生长。增加负偏压会发生新反应，出现Ti2AlN(100)衍射峰。随着基体负偏压的增大，薄膜的显微硬度呈先增加后减小的趋势。当负偏压在150 V时，薄膜具有最大的硬度值，为2 725 HV。当负偏压工艺为150 V时，薄膜的相对腐蚀速率最小，耐腐蚀性最好。

关键词： 负偏压; 多弧离子镀; TiAlN薄膜; 微观结构; 耐腐蚀性

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赵磊, 梁启超, 刘传龙, 王天国 . 不同负偏压下多弧离子镀TiAlN薄膜的微观结构与耐腐蚀性研究[J]. 材料保护, 2022 , 55(10) : 118 -122 . DOI: 10.16577/j.issn.1001-1560.2022.0285

Abstract

At present,there are few studies focusing on the effect of negative bias voltage on the corrosion resistance of TiAlN films deposited by arc ion plating.In this paper,TiAlN films were deposited on M2 high speed steel by arc ion plating,and scanning electron microscope (SEM),X-ray diffraction (XRD),electrochemical test and other methods were used to study the influences of negative bias voltage on substrate on the microstructure,surface morphology and corrosion resistance of the as-prepared films.Results showed that the negative bias voltage was an important process parameter affecting the surface morphology of TiAlN films deposited by arc ion plating.A proper negative bias voltage could effectively improve the morphology and compactness of the surface film and reduce the size and number of large molten droplets on the surface.The main phase of TiAlN films was AlTi3N(111),and the films mainly grew along the (111) direction.When the negative bias voltage was increased,a new reaction would occur and a Ti2AlN (100) diffraction peak would appear.With the increase of the negative bias voltage on substrate,the microhardness of the films increased first and then decreased.When the negative bias voltage was 150 V,the microhardness reached the maximum value of 2 725 HV,the relative corrosion rate was the lowest,and the corrosion resistance was the best.

Key words： negative bias voltage; multi-arc ion plating; TiAlN film; microstructure; corrosion resistance

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