基体偏压幅值对NiCrN 薄膜微观结构及力学性能的影响

赵彦辉, 赵鑫, 宋贵宏

doi:10.16577/j.issn.1001-1560.2024.0277

材料保护 >

2024 , Vol. 57 >Issue 12: 122 - 130

DOI: https://doi.org/10.16577/j.issn.1001-1560.2024.0277

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基体偏压幅值对NiCrN 薄膜微观结构及力学性能的影响

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1.上海电子信息职业技术学院中德工程学院2.沈阳工业大学材料科学与工程学院

赵彦辉(1973－)，博士，副研究员，主要研究方向为PVD 镀膜及防护涂层等，E-mail: pbaip2002＠126.com

收稿日期: 2024-04-13

修回日期: 2024-05-05

录用日期: 2024-05-25

网络出版日期: 2025-01-14

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Effect of Substrate Bias Voltage Amplitude on the Microstructure and Mechanical Properties of NiCrN Films

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(1.Sino-German Institute of Engineering， Shanghai Technical Institute Electronics ＆ Information， Shanghai 201411， China；2.School of Materials Science and Engineering， Shenyang University of Technology， Shenyang 110870， China)

ZHAO Yanhui(1973－)， Ph.D.， Associate Researcher， Research Focus: PVD Coatings and Protective Coatings，etc.， E-mail : pbaip2002＠126.com

Received date: 2024-04-13

Revised date: 2024-05-05

Accepted date: 2024-05-25

Online published: 2025-01-14

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摘要

为了进一步提高海洋环境下膜层的使用寿命，采用电弧离子镀技术在304 不锈钢基体表面沉积了NiCrN 膜层，利用扫描电子显微镜(SEM)、 X 射线衍射仪(XRD)、X 射线光电子能谱(XPS)、纳米压痕仪、多功能材料表面性能试验仪、电化学工作站等测试方法，系统地研究了基体偏压幅值对膜层成分、微观结构、力学性能及耐腐蚀性能的影响。结果表明:膜层主要由金属Cr 相、金属Ni 相和CrN 陶瓷相组成。随着偏压幅值的增加，膜层的厚度、硬度均呈先升高后降低的趋势，在偏压幅值为－150 V 时硬度达到最高值2 030 HV。基体偏压幅值为－50 V时的膜层具有最佳的耐磨性能，此时磨损率最低。膜层腐蚀电位随着基体偏压幅值的增大而逐渐正移，腐蚀电流密度逐渐降低，在偏压幅值为－150 V 时，膜层的耐腐蚀性能最佳。

关键词： 电弧离子镀; NiCrN 薄膜; 微观组织; 力学性能

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赵彦辉, 赵鑫, 宋贵宏 . 基体偏压幅值对NiCrN 薄膜微观结构及力学性能的影响[J]. 材料保护, 2024 , 57(12) : 122 -130 . DOI: 10.16577/j.issn.1001-1560.2024.0277

Abstract

To further improve the service life of the films in the marine environment，NiCrN films with different substrate bias voltages were deposited on a 304 stainless steel substrate by arc ion plating technology.The effects of the substrate bias voltage on the composition， microstructure， mechanical properties and corrosion resistance of the films were systematically investigated using scanning electron microscopy (SEM)，X-ray diffraction (XRD)， X-ray photoelectron spectroscopy (XPS)， nanoindentation， multifunctional surface properties tester and electrochemical workstation methods.Results showed that the films were primarily composed of metallic Cr， metallic Ni and CrN ceramic phases.As the bias voltage amplitude increased， the thickness and hardness of the films increased， then decreased.When the bias voltage amplitude was－150 V， the hardness reached the maximum value of 2 030 HV.When the substrate bias amplitude was－50 V， the film had the best wear resistance，and the wear rate was the lowest.The corrosion potential of the film shifted positively with the increase of substrate bias amplitude，and the corrosion current density was gradually reduced.When the bias amplitude was－150 V， the corrosion resistance of the film was the best.

Key words： arc ion plating; NiCrN thin film; microstructure; mechanical property

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