基体位置对封闭磁控溅射制备CrN镀层微观结构和力学性能的影响

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2022 , Vol. 55 >Issue 6: 120 - 126

DOI: https://doi.org/10.16577/j.issn.1001-1560.2022.0165

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基体位置对封闭磁控溅射制备CrN镀层微观结构和力学性能的影响

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1. 武威职业学院； 2. 宁波工程学院材料与化学工程学院

冶艳(1984-)，硕士研究生，主要从事表面材料方面的研究，电话：15346952829，E - mail：yeyan841218@163.com

收稿日期: 2021-12-23

修回日期: 2022-01-18

录用日期: 2022-02-28

网络出版日期: 2024-01-09

基金资助

2021年甘肃省高等学校创新基金项目(2021B - 525)资助

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Influence of Substrate Position on the Microstructure and Mechanical Properties of CrN Coating Prepared by Closed Magnetron Sputtering

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1. Wuwei Vocational College, Wuwei 733000, China;2. School of Materials and Chemical Engineering, Ningbo University of Technology, Ningbo 315211, China

Received date: 2021-12-23

Revised date: 2022-01-18

Accepted date: 2022-02-28

Online published: 2024-01-09

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摘要

为了制备性能优良的CrN镀层，基体在系统中不同位置(一轴、三轴)下采用封闭非平衡磁控溅射制备了CrN镀层，研究了基体位置对镀层微观结构和力学性能的影响。结果表明：基体与靶材的位置对CrN镀层的物相组成无影响，均为CrN(111)、CrN(200)、CrN(220)晶面；在一轴上制备的CrN镀层的晶粒粒径较小，致密度小，厚度约为3.2 μm，膜基结合强度为HF4，杂质相Cr2N含量较多，摩擦系数在0.725～0.975之间。三轴上制备的CrN镀层的晶粒粒径较大、致密度高，厚度约为2.2 μm，膜基结合强度为HF1，杂质相Cr2N少，摩擦系数在0.525～0.700之间。

关键词： 磁控溅射; CrN镀层; 基体位置; 微观结构

本文引用格式

冶艳, 鲍明东 . 基体位置对封闭磁控溅射制备CrN镀层微观结构和力学性能的影响[J]. 材料保护, 2022 , 55(6) : 120 -126 . DOI: 10.16577/j.issn.1001-1560.2022.0165

Abstract

In order to obtain excellent properties of CrN coating, the CrN coating was prepared by closed unbalanced magnetron sputtering with substrate locating in different positions (one - axis, three - axis) in the system to study the effects of substrate position on the microstructure and mechanical properties of the coating. Results showed that the positions of substrate and target had no effect on the phase composition of the CrN coating, which all turned out to be CrN (111), CrN (200), and CrN (220) crystal planes. The CrN coating prepared on one - axis possessed smaller grain size, low density, thickness of about 3.2 μm, coating - substrate binding force of HF4, more impurity phase of Cr2N, and friction coefficient of 0.725～0.975, while the CrN coating prepared on three - axis had larger grain size, high density, thickness of about 2.2 μm, coating - substrate binding force of HF1, less impurity phase of Cr2N, and friction coefficient of 0.525～0.700.

Key words： magnetron sputtering; CrN coating; substrate position; microstructure

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