高功率脉冲磁控溅射技术制备ta-C膜及性能改性研究
收稿日期: 2024-01-03
修回日期: 2024-01-27
录用日期: 2024-01-30
网络出版日期: 2024-07-30
基金资助
国家重点研发计划(2019YFE0123900)项目
Preparation of ta-C Film by High-Power Impulse Magnetron Sputtering Technology and Its Performance Modification
Received date: 2024-01-03
Revised date: 2024-01-27
Accepted date: 2024-01-30
Online published: 2024-07-30
Supported by
Project of National Key Research and Development Plan (2019YFE0123900)
冯利民, 史敬伟, 何哲秋, 李建中, 石俊杰 . 高功率脉冲磁控溅射技术制备ta-C膜及性能改性研究[J]. 材料保护, 2024 , 57(7) : 23 -29 . DOI: 10.16577/j.issn.1001-1560.2024.0147
Key words: high power impulse magnetron sputtering; ta-C film; C2H2; film properties
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