Email Alert  RSS
新型薄膜技术专栏

偏压对HiPIMS制备TiAlSiN涂层结构与性能的影响

展开
  • (1. 中国机械总院集团武汉材料保护研究所有限公司, 湖北 武汉 430030;2. 特种表面保护材料及应用技术国家重点实验室, 湖北 武汉 430030;3. 武汉理工大学汽车工程学院, 湖北 武汉 430070;4. 武汉瑞阳化工有限公司, 湖北 黄冈 438000)
陈 辉(1985-), 高级工程师,博士,主要研究方向为表面工程,E-mail:chenjiahao87@ 126.com

收稿日期: 2024-02-04

  修回日期: 2024-03-05

  录用日期: 2024-03-15

  网络出版日期: 2024-07-30

基金资助

装备制造基础通用国际标准研究(2021YFF0601702);湖北省重点研发计划项目(2021BAA210);国家自然科学基金面上基金项目(52175182);湖北省自然科学基金计划项目(2022CFB936)

Influence of Bias Voltage on Microstructure and Properties of TiAlSiN Coatings Prepared by HiPIMS

Expand
  • (1. China Academy of Machinery Wuhan Research Institute of Materials Protection Co., Ltd., Wuhan 430030, China;2. State Key Laboratory of Special Surface Protection Materials and Application Technology, Wuhan 430030, China;3. School of Automotive Engineering, Wuhan University of Technology, Wuhan 430070, China;4. Wuhan Redsun Chemical Co., Ltd., Huanggang 438000, China)
CHEN Hui(1985-), Senior Engineer, Ph.D., Research Focus: Surface Engineering, E-mail:chenjiahao87@126.com

Received date: 2024-02-04

  Revised date: 2024-03-05

  Accepted date: 2024-03-15

  Online published: 2024-07-30

Supported by

the Research on General International Standards for Equipment Manufacturing Fundamentals(2021YFF0601702);the Hubei Provincial Key Research and Development Program of China(2021BAA210);National Natural Science Foundation General Program of China(52175182);Hubei Provincial Natural Science Foundation of China(2022CFB936)

摘要

为了探究偏压对高功率脉冲磁控溅射(HiPIMS)制备TiAlSiN 涂层的成分结构、力学性能与摩擦学性能的影响与机制,利用HiPIMS 技术,通过调控基体偏压(0 ~-200 V)在YG8 硬质合金与N 型单晶(111)Si 上沉积TiAlSiN 涂层。 采用扫描电子显微镜(SEM)、X 射线衍射仪(XRD)、电子探针(EPMA)、X 射线光电子能谱仪(XPS)、超景深显微镜、白光干涉仪、纳米压痕仪、划痕仪、往复式摩擦磨损试验机对TiAlSiN 涂层进行微观结构、组成表征与性能测试。 结果表明:HiPIMS 放电行为方面,偏压的升高会使HiPIMS 起辉电压提高,但对平台阶段放电电压与放电电流影响并不明显;在不同偏压条件下所制备的TiAlSiN 涂层中元素组成相对含量变化较小;随着偏压的升高TiAlSiN 涂层由hcp-(Ti,Al)N+fcc-(Ti,Al)N 转变为fcc-(Ti,Al)N;随着偏压的升高会使涂层截面结构从疏松的柱状晶结构转变为无明显缺陷的致密堆积结构,表面结节状缺陷消失,且晶粒尺寸逐渐降低;力学性能方面,随着偏压的升高,TiAlSiN 涂层的硬度与结合力均呈现上升趋势,涂层在-200 V 时达到最佳性能,其中硬度达到最大的26.19 GPa,H/E*达到最大的0.099 5,结合力在达到最大的19.63 N 时,涂层磨损率最小,为9×10-15 m3/(N·m)。 综上可知,利用HiPIMS 技术,通过改变基体偏压能实现涂层微观结构与性能的调控,提高涂层韧性的同时,还能显著提升涂层的结合力与摩擦学性能。

本文引用格式

杜建融, 陶冠羽, 陈辉, 易娟, 万洪, 刘书洋, 张钰 . 偏压对HiPIMS制备TiAlSiN涂层结构与性能的影响[J]. 材料保护, 2024 , 57(7) : 30 -42 . DOI: 10.16577/j.issn.1001-1560.2024.0148

Abstract

For investigating the influence and mechanism of bias voltage on the composition structure, mechanical properties and tribological properties of TiAlSiN coatings prepared by high-power pulsed magnetron sputtering(HiPIMS), TiAlSiN coatings were deposited on YG8 hardness alloy and N-type single crystal (111) Si by HiPIMS technology with regulating substrate bias voltage (0~-200 V).The microstructure,composition characterization and performance testing of TiAlSiN coatings were carried out by scanning electron microscopy (SEM),X-ray diffraction (XRD), electron probe microscopy (EPMA), X-ray photoelectron spectroscopy (XPS), ultra depth of field microscopy, white light interferometry, nanoindentation, scratch and reciprocating friction and wear testing machines.Results showed that in terms of HiPIMS discharge behavior, an increase in bias voltage could increase the HiPIMS ignition voltage, but the impact on the discharge voltage and current during the platform stage was not significant.The relative changes in elemental composition of TiAlSiN coatings prepared under different bias conditions were relatively small.As the bias voltage increased, the TiAlSiN coating changed from hcp-(Ti, Al)N+fcc-(Ti, Al) N to fcc-(Ti, Al)N.In addition, as the bias voltage increased, the cross-sectional structure of the coating transformed from a loose columnar crystal structure to a dense stacked structure without obvious defects, with surface nodular defects disappearing and grain size gradually decreasing.In terms of mechanical properties, with the increase of bias voltage, the hardness and adhesion of TiAlSiN coating exhibited an upward trend.The coating prepared at-200 V achieved optimal performance, with a maximum hardness of 26.19 GPa and a maximum H/E* of 0.099 5.When the bonding force reached a maximum of 19.63 N,the coating had the lowest wear rate,which was 9×10-15 μm3/(N·m).Based on the above analysis, the microstructure and properties of the coating could be controlled by changing the substrate bias voltage during HiPIMS process, which also improved the toughness of the coating and enhanced the adhesion and tribological properties of the coating significantly.



文章导航

/