Application of Computational Fluid Dynamics in Chemical Vapor Deposition Simulation

doi:10.16577/j.issn.1001-1560.2022.0259

ZHANG Bowen, WU Yong, YANG Fu, XIA Siyao, HUANG Tianzong, MENG Shixu

Materials Protection ›› 2022, Vol. 55 ›› Issue (9) : 141-147.

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Materials Protection ›› 2022, Vol. 55 ›› Issue (9) : 141-147. DOI: 10.16577/j.issn.1001-1560.2022.0259

Application of Computational Fluid Dynamics in Chemical Vapor Deposition Simulation

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2022, 55(9): 141-147 https://doi.org/10.16577/j.issn.1001-1560.2022.0259

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