Research Progress of Titanium Nitride Thin Films Prepared by Magnetron Sputtering Technology

doi:10.16577/j.issn.1001-1560.2023.0041

LI Chang-heng, LIU Kui-ren, WEI Shi-cheng, HAN Qing, WANG Bo, WANG Yu-jiang

Materials Protection ›› 2023, Vol. 56 ›› Issue (2) : 111-119.

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Materials Protection ›› 2023, Vol. 56 ›› Issue (2) : 111-119. DOI: 10.16577/j.issn.1001-1560.2023.0041

Research Progress of Titanium Nitride Thin Films Prepared by Magnetron Sputtering Technology

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2023, 56(2): 111-119 https://doi.org/10.16577/j.issn.1001-1560.2023.0041

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