Preparation of ta-C Film by High-Power Impulse Magnetron Sputtering Technology and Its Performance Modification

doi:10.16577/j.issn.1001-1560.2024.0147

FENG Limin, SHI Jingwei, HE Zheqiu, LI Jianzhong, SHI Junjie

Materials Protection ›› 2024, Vol. 57 ›› Issue (7) : 23-29.

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Materials Protection ›› 2024, Vol. 57 ›› Issue (7) : 23-29. DOI: 10.16577/j.issn.1001-1560.2024.0147

Preparation of ta-C Film by High-Power Impulse Magnetron Sputtering Technology and Its Performance Modification

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2024, 57(7): 23-29 https://doi.org/10.16577/j.issn.1001-1560.2024.0147

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