Process Optimization of Plasma Etching on the Size Reduction of Polystyrene Microspheres

doi:10.16577/j.issn.1001-1560.2025.0114

SUN Shiyang, HUANG Shengbao, QIAN Yuanjin, LIU Dongkun, LI Jiabin, REN Yuan, ZHANG Wenxing

Materials Protection ›› 2025, Vol. 58 ›› Issue (7) : 58-65.

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Materials Protection ›› 2025, Vol. 58 ›› Issue (7) : 58-65. DOI: 10.16577/j.issn.1001-1560.2025.0114

Process Optimization of Plasma Etching on the Size Reduction of Polystyrene Microspheres

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2025, 58(7): 58-65 https://doi.org/10.16577/j.issn.1001-1560.2025.0114

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