Research Progress of (Ti,Al,Cr)N Hard Film System

LIU Cong, ZHANG Jun, ZHANG Re - han, LI Ning

doi:10.16577/j.cnki.42-1215/tb.2021.03.023

Materials Protection >

2021 , Vol. 54 >Issue 3: 131 - 136

DOI: https://doi.org/10.16577/j.cnki.42-1215/tb.2021.03.023

Research Progress of (Ti,Al,Cr)N Hard Film System

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(1. Key Laboratory of Multi - group Hard Film Research and Application in Liaoning Province, Shenyang 110044, China;2. College of Mechanical Engineering, Shenyang University, Shenyang 110044, China)

Received date: 2020-09-18

Online published: 2025-07-10

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Abstract

In this work, the deposition method of (Ti,Al,Cr)N film system was summarized, and the effects of the chemical composition, N2 flow rate, the substrate bias voltage on the films were discussed. The phase composition, the film composition, the oxidation resistance, the corrosion resistance, the microhardness, the friction and wear resistance and the adhesion of (Ti,Al,Cr)N films were described in detail. Based on the above, the future development of (Ti,Al,Cr)N films was prospected so as to provide reference for the further research of multi - component nitride hard films.

Key words： (Ti,Al,Cr)N hard film system; oxidation resistance; corrosion resistance; microhardness; friction and wear resistance

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LIU Cong, ZHANG Jun, ZHANG Re - han, LI Ning . Research Progress of (Ti,Al,Cr)N Hard Film System[J]. Materials Protection, 2021 , 54(3) : 131 -136 . DOI: 10.16577/j.cnki.42-1215/tb.2021.03.023

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