Quantitative Control of Current Density for Barrel Plating

HOU Jin

doi:10.16577/j.issn.1001-1560.2022.0320

Materials Protection >

2022 , Vol. 55 >Issue 11: 128 - 132

DOI: https://doi.org/10.16577/j.issn.1001-1560.2022.0320

Quantitative Control of Current Density for Barrel Plating

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(Handan Dashun Electroplating Equipment Co., Ltd., Handan 056106, China)

Received date: 2022-05-27

Revised date: 2022-06-29

Accepted date: 2022-07-20

Online published: 2023-12-26

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Abstract

Current density is an important process parameter that must be controlled in electroplating processing. Quantitative control of current density is of great significance to improve product quality and production efficiency. In this paper, the rack plating current density control method was introduced, and the prevailing as well as the scientific barrel plating current density control methods were evaluated. Also, it was pointed out that the prevailing barrel plating current density control method was not scientific while the scientific barrel plating current density control method was difficult to conduct, both methods were defective and should be corrected or adjusted according to the circumstances. Besides, a simple barrel plating current density control method - calculated by barrel, was also adopted in production to help to complete the plating task.

Key words： barrel plating; current density; quantitative control; effective plating area

Cite this article

HOU Jin . Quantitative Control of Current Density for Barrel Plating[J]. Materials Protection, 2022 , 55(11) : 128 -132 . DOI: 10.16577/j.issn.1001-1560.2022.0320

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