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中文
Process Regulation and Properties of Plasma-Cladded Layers on Tubular Copper Components
ZHANG Chao, CHENG Sheng, TU Demei, ZHAO Lulu, BAI Dan, WANG Dongsheng, CHEN Shoudong
Materials Protection . 2026, (
6
): 188 -198 . DOI: 10.16577/j.issn.1001-1560.2026.0097
