Effects of Doping Cr and Cr-Ni on the Properties of TiAlN Thin Films under Different Bias Voltage

LIANG Wei-zhong, WANG Cheng-lei, ZHANG Ke-xiang, LIANG Chao-jie, XIE Ying-guang, LIN De-min

doi:10.16577/j.cnki.42-1215/tb.2021.02.013

Materials Protection >

2021 , Vol. 54 >Issue 2: 76 - 80

DOI: https://doi.org/10.16577/j.cnki.42-1215/tb.2021.02.013

Effects of Doping Cr and Cr-Ni on the Properties of TiAlN Thin Films under Different Bias Voltage

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(1. School of Materials Science and Engineering, Guilin University of Electronic Technology, Guilin 541004, China; 2. Guangxi Key Laboratory of Information Materials, Guilin University of Electronic Technology, Guilin 541004, China; 3. Guangxi Mingxin Chassis Parts Co., Ltd., Guilin 541004, China)

Received date: 2020-09-13

Online published: 2025-07-10

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Abstract

In order to optimize the surface properties of 4Cr13 stainless steel and obtain the best bias process of film preparation, the TiAlN films doped with Cr or Cr-Ni were deposited on the surface of 4Cr13 stainless steel by multi-arc ion plating and magnetron sputtering under different bias voltage processes. The adhesion between the film and the substrate under different bias voltage conditions was studied by adhesion automatic scratch tester, and the surface morphology of the film was observed and analyzed by scanning electron microscope (SEM). In addition, the phase structure of the film was detected by X-ray diffraction (XRD), and the apparent microhardness was measured by microhardness tester. Results showed that proper bias voltage could improve the hardness and adhesion of the films. When the bias voltage was -250 V, the surface hardness of the films reached the maximum value of 2 259 HV0.1 N, and the adhesion force was 34 N. Besides, doping Ni element could enhance the adhesion force between the film and substrate.

Key words： multi-arc ion plating; magnetron sputtering; bias voltage; doping; Cr; Ni; TiAlN film

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LIANG Wei-zhong, WANG Cheng-lei, ZHANG Ke-xiang, LIANG Chao-jie, XIE Ying-guang, LIN De-min . Effects of Doping Cr and Cr-Ni on the Properties of TiAlN Thin Films under Different Bias Voltage[J]. Materials Protection, 2021 , 54(2) : 76 -80 . DOI: 10.16577/j.cnki.42-1215/tb.2021.02.013

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