Application of Computational Fluid Dynamics in Chemical Vapor Deposition Simulation
Received date: 2022-03-18
Revised date: 2022-04-12
Accepted date: 2022-05-03
Online published: 2023-12-23
Key words: CVD; computational fluid dynamics; simulation method; application of CFD
ZHANG Bowen, WU Yong, YANG Fu, XIA Siyao, HUANG Tianzong, MENG Shixu . Application of Computational Fluid Dynamics in Chemical Vapor Deposition Simulation[J]. Materials Protection, 2022 , 55(9) : 141 -147 . DOI: 10.16577/j.issn.1001-1560.2022.0259
/
〈 |
|
〉 |