Preparation of ta-C Film by High-Power Impulse Magnetron Sputtering Technology and Its Performance Modification
Received date: 2024-01-03
Revised date: 2024-01-27
Accepted date: 2024-01-30
Online published: 2024-07-30
Supported by
Project of National Key Research and Development Plan (2019YFE0123900)
Key words: high power impulse magnetron sputtering; ta-C film; C2H2; film properties
FENG Limin, SHI Jingwei, HE Zheqiu, LI Jianzhong, SHI Junjie . Preparation of ta-C Film by High-Power Impulse Magnetron Sputtering Technology and Its Performance Modification[J]. Materials Protection, 2024 , 57(7) : 23 -29 . DOI: 10.16577/j.issn.1001-1560.2024.0147
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